Optically induced tungsten plug (W-plug) corrosion defects on wafers stored in a water tank waiting for a cleaning treatment during post tungsten chemical mechanical planarization (WCMP) were verified using KLA scan, queue-time (Q-time) splits, layout tracing, SEM/FIB inspection and electric measurement. Reliability tests on an out of control limitation lot also found W-plug corrosion interconnect failures as Q-time went overdue with the defects experiencing a layout dependency. The W-plug corrosion mechanism is being proposed. The installation of yellow lights in the WCMP environment could make Q-time longer but does not completely solve the issue.
If you need any more details of the above news and/or products, please visit Chinatungsten Online, or contact us directly. Disclaimer: The article is only reflecting the opinions of the author. We have no responsibility to prove the originality and authenticity of the content, words and/or pictures. You readers should just take it as reference and check the details by yourselves. And the content is not a suggestion for investment decision. The investor takes his or her own risks if he or she operates accordingly. If you have any dissent about the contents above, please contact the relevant author, or the webmaster. We will try our best to assist the dealing of the related issues. Thanks for your visit and cooperation.